Electromagnetic modeling of near-field phase-shifting contact lithography with broadband ultraviolet illumination

17 Aug 2019 Wang Fei Weaver Katherine E. Lakhtakia Akhlesh Horn Mark W.

Near-field phase-shifting contact lithography is modeled to characterize electromagnetic absorption in a photoresist layer with one face in contact with a quartz binary phase-shift mask. The broadband ultraviolet illumination is represented as a frequency-spectrum of normally incident plane waves... (read more)

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