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Deep learning denoiser assisted roughness measurements extraction from thin resists with low Signal-to-Noise Ratio(SNR) SEM images: analysis with SMILE
The technological advance of High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUVL) has opened the gates to extensive researches on thinner photoresists (below 30nm), necessary for the industrial implementation of High NA EUVL.
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